Entegris Launches Oktolex(TM) Membrane Technology To Improve Yield In ArF, KrF, And EUV Lithography For Logic, DRAM, And 3D NAND Devices
Oktolex(TM) offers best-in-class filtration, faster priming, and reduced tool downtime
BILLERICA, Mass., Sept. 13, 2017 /PRNewswire/ -- Entegris Inc. (NASDAQ: ENTG), a leading specialty materials provider, announced at SEMICON® Taiwan today, the availability of its innovative Oktolex™ membrane technology for advanced point-of-use photolithography applications. Oktolex's revolutionary membranes remove critical photochemical contaminants by enhancing the native retention mechanisms of each membrane type to match the needs of each chemistry. By matching membrane characteristics with specific contaminant-adsorption mechanisms, Oktolex membranes further optimize removal performance with no adverse interactions with the chemical composition.
"Breaking from convention, we've developed a cleaner, faster, and more effective way to remove the most challenging contaminants with a tailored approach to the specific contamination control needs of ArF, KrF, and EUV applications for Logic, DRAM, and 3D NAND devices," noted Entegris Senior Vice President and General Manager of Microcontamination Control, Clint Haris. "The true advantage of this technology is its ability to create membranes that effectively remove the targeted contaminants, while not altering the chemical composition. This combination enables us to collaborate with customers to create precise contaminant removal solutions that meet the needs of advanced nodes and reduce tool downtime."
Oktolex technology is currently available in Entegris Impact® 8G point-of-use photochemical filters.
For more information, please visit the Entegris product display area, booth #176, during
SEMICON Taiwan, Sept. 13-15, 2017, at the Taipei Nangang Exhibition Center, or visit www.entegris.com/Impact8GFilters.
Entegris is a leading specialty materials provider for the microelectronics industry and other high-tech industries. Entegris is ISO-9001 certified and has manufacturing, customer service and/or research facilities in the United States, China, France, Germany, Israel, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information may be found at www.entegris.com.
Media Contact: Asia & Japan
+1 217 766 1011
Media Contact: U.S. & Europe
+1 602 502 1397
View original content with multimedia:http://www.prnewswire.com/news-releases/entegris-launches-oktolex-membrane-technology-to-improve-yield-in-arf-krf-and-euv-lithography-for-logic-dram-and-3d-nand-devices-300519292.html
SOURCE Entegris Inc.
© 2017 PR Newswire. All Rights Reserved.