--(BUSINESS WIRE)-- Atomera Incorporated (Nasdaq: ATOM):

Atomera Incorporated will present a talk at The Incize RF Workshop 2025: Shaping the Future of RF Technology, highlighting advancements in Radio-Frequency Silicon-on-Insulator (RF-SOI) devices driven by Oxygen-Inserted (OI) Epitaxy technology. The session will delve into how Atomera’s Mears Silicon Technology™ (MST^®) OI technology enhances mobility, reduces power handling issues and optimizes performance of RF-SOI switches and also enables co-optimization of Low-Noise Amplifier (LNA) devices. As the RF industry continues to evolve, this innovative approach to dopant engineering enables the creation of unique doping profiles throughout the RF-SOI manufacturing process, offering superior RF performance and precise dopant engineering in semiconductor devices — further advancing device performance for next-gen applications, including 5G and future 6G technologies. In addition, Atomera will highlight its ongoing collaboration with Soitec to enable MST on RF-SOI substrates, facilitating faster adoption and scaling for production volumes.

Follow Atomera:

Company website: https://atomera.com/

Atomera whitepapers: https://atomera.com/news-and-blogs/

Atomera blog: https://atomera.com/news-and-blogs/

LinkedIn: www.linkedin.com/company/atomera/

About Atomera

Atomera Incorporated, one of America’s top 100 Best Small Companies in 2022 ranked by Forbes, is a semiconductor materials and technology licensing company focused on deploying its proprietary, silicon-proven technology into the semiconductor industry. Atomera has developed Mears Silicon Technology™ (MST^®), which increases performance and power efficiency in semiconductor transistors. MST can be implemented using equipment already deployed in semiconductor manufacturing facilities and is complementary to other nano-scaling technologies in the semiconductor. More information can be found at www.atomera.com.

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